High End Beauty
Your destination for an expertly curated range of the finest beauty and skincare products from across the world.
PRODUCT DESCRIPTION
Face mask for professional use with a specific creamy texture for sensitive skin or skin with dermatological alterations, such as rosacea and couperose.
The high concentration of soothing active ingredients contained in the formula, combined with white clay, with healing and anti-inflammatory properties, act on the skin by eliminating dead cells present on the surface and in the innermost layers of the dermis, retaining toxins and bacteria.
The skin appears visibly toned and decongested and is ready to receive subsequent treatments.
FEATURES
Soothing action on reddened skin
Remineralizing action of the epidermal tissue
Immediate feeling of comfort
Ideal for sensitive skin
Paraffinum Free
Paraben Free
Gmo-Free
METHOD OF USE
Apply to face, neck and décolleté and leave for 15 minutes.
Rinse with warm water.
ACTIVE PRINCIPLES
White Clay:
It has strong detoxifying, anti-fermentative and anti-inflammatory properties
Hyaluronic Acid:
It prevents and treats anti-aging processes by reducing visible wrinkles and fine lines that appear on the face
Panthenol:
The moisturizing and emollient properties counteract skin aging, promote re-epithelialization (wound healing), stimulate the cells of the dermis
Bisabolol:
The anti-inflammatory and softening properties have a calming power on reddened and sensitized skin.
Glycyretic Acid:
The anti-inflammatory, antioxidant and antimicrobial properties help improve the skin microbiota.
INGREDIENTS
AQUA, KAOLIN, GLYCERIN, CETEARYL ALCOHOL, TITANIUM DIOXIDE, CETEARETH-25, TOCOPHERYL ACETATE, PANTHENOL, SODIUM HYALURONATE, ELASTIN, GLYCYRRHETINIC ACID, BISABOLOL, HYDROXYETHYLCELLULOSE, PHENOXYETHANOL, XANTHAN GUM, CITRIC ACID, ETHYLHEXYLGLYCERIN, TETRASODIUM EDTA, PARFUM, PROPYLENE GLYCOL, ISOPROPYL ALCOHOL, CELLULOSE, PENTYLENE GLYCOL
Your destination for an expertly curated range of the finest beauty and skincare products from across the world.